[Ben Krasnow] hacked together a method of cleaning sides using plasma. His setup uses a mechanical vacuum pump to evacuate a bell jar. This bell jar is wrapped with a copper coil, which is connected to an RF transmitter. By transmitting RF into the coil, plasma is created inside the bell jar.
Plasma cleaning is used extensively in the semiconductor industry. Depending on the gas used, it can have different cleaning effects. For example, an oxygen rich environment is very effective at breaking down organic bonds and removing hydrocarbons. It is used after manual cleaning to ensure that all impurities in the solvents used for cleaning are fully removed. According to [Ben], it’s possible to get a surface atomically clean using this process, and even remove the substrate if the energy levels are too high.
These machines are usually expensive and specialized, but [Ben] managed to cook one up…
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